完整後設資料紀錄
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dc.contributor.authorChen, Kuang-Chungen_US
dc.contributor.authorChen, Chia-Fuen_US
dc.contributor.authorLee, Jen-Haoen_US
dc.contributor.authorWu, Tai-Linen_US
dc.contributor.authorHwang, Chian-Liangen_US
dc.contributor.authorTai, Nyan-Hwaen_US
dc.contributor.authorHsiao, Ming-Chunen_US
dc.date.accessioned2019-04-02T06:01:04Z-
dc.date.available2019-04-02T06:01:04Z-
dc.date.issued2007-03-01en_US
dc.identifier.issn0925-9635en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.diamond.2006.11.058en_US
dc.identifier.urihttp://hdl.handle.net/11536/149157-
dc.description.abstractFor field emission application, carbon nanotube emitters were synthesized on catalyst-mixed thick-film electrode lower than 500 degrees C by chemical vapor deposition (CVD) method. Mixtures of Ni/tetraethyl silicate (TEOS) and conducting Ag powders were applied to fabricate the electrode by screen-printing processes. These processes are simple, low cost and easy to scale up for large sized panels. The field emission properties performed uniform emission image and high brightness (no less than 500 nits). The turn-on electric field was about 3.85 V/mu m with an emission current destiny of 10 mu A/cm(2), and the achieved current density was 1 mA/cm(2) driven by 5 V/mu m. (c) 2006 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectcarbon nanotubesen_US
dc.subjectcatalysten_US
dc.subjectCVDen_US
dc.titleLow-temperature CVD growth of carbon nanotubes for field emission applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.diamond.2006.11.058en_US
dc.identifier.journalDIAMOND AND RELATED MATERIALSen_US
dc.citation.volume16en_US
dc.citation.spage566en_US
dc.citation.epage569en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000244827100025en_US
dc.citation.woscount15en_US
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