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dc.contributor.authorLin, Y. H.en_US
dc.contributor.authorSun, Y. C.en_US
dc.contributor.authorJian, W. B.en_US
dc.contributor.authorChang, H. M.en_US
dc.contributor.authorHuang, Y. S.en_US
dc.contributor.authorLin, J. J.en_US
dc.date.accessioned2019-04-02T06:01:10Z-
dc.date.available2019-04-02T06:01:10Z-
dc.date.issued2008-01-30en_US
dc.identifier.issn0957-4484en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0957-4484/19/04/045711en_US
dc.identifier.urihttp://hdl.handle.net/11536/149357-
dc.description.abstractWe have studied the electrical transport properties of individual single-crystalline IrO2 nanorods prepared by the metal-organic chemical vapour deposition method. With the help of the standard electron-beam lithographic technique, individual nanorods are contacted by Cr/Au submicron electrodes from above. Utilizing two-probe, three-probe and four-probe measurement configurations, not only the intrinsic electrical transport properties of the individual nanorods but also the electronic contact resistances, Rc(T), have been determined from 300 K down to liquid-helium temperatures. Our measured resistivity behaviour of the nanorods is in close agreement with the current theoretical understanding of this rutile material. On the other hand, we found that the temperature behaviour of the electronic contact resistance obeys the law log R-C alpha T-1/2 over an extremely wide temperature range, from approximately 100 K down to liquid-helium temperatures. This latter conduction process is ascribed to the hopping of electrons through nanoscale Cr granules and/or an amorphous coating incidentally formed at the interface between the submicron Cr/Au electrode and the nanorod.en_US
dc.language.isoen_USen_US
dc.titleElectrical transport studies of individual IrO2 nanorods and their nanorod contactsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0957-4484/19/04/045711en_US
dc.identifier.journalNANOTECHNOLOGYen_US
dc.citation.volume19en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000252967000034en_US
dc.citation.woscount13en_US
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