Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering

doi:10.1016/S0040-6090(96)09311-X

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Wu, WF	en_US
dc.contributor.author	Chiou, BS	en_US
dc.date.accessioned	2019-04-02T05:59:55Z	-
dc.date.available	2019-04-02T05:59:55Z	-
dc.date.issued	1997-04-20	en_US
dc.identifier.issn	0040-6090	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/S0040-6090(96)09311-X	en_US
dc.identifier.uri	http://hdl.handle.net/11536/149563	-
dc.description.abstract	Indium tin oxide (ITO) films have been deposited onto polycarbonate (PC) substrates by radio frequency (rf) magnetron sputtering. The influence of the oxygen content during sputtering on the film morphology, and the electrical and optical properties of the films have been investigated. Both the refractive index and the extinction coefficient decrease with increasing oxygen content. In this study, the figures of merit T-10/R-sh of the films are higher than those for low-temperature sputtered films reported in the literature. (C) 1997 Elsevier Science S.A.	en_US
dc.language.iso	en_US	en_US
dc.subject	coatings	en_US
dc.subject	indium oxide	en_US
dc.subject	optical properties	en_US
dc.subject	sputtering	en_US
dc.title	Deposition of indium tin oxide films on polycarbonate substrates by radio-frequency magnetron sputtering	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/S0040-6090(96)09311-X	en_US
dc.identifier.journal	THIN SOLID FILMS	en_US
dc.citation.volume	298	en_US
dc.citation.spage	221	en_US
dc.citation.epage	227	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:A1997XH32400038	en_US
dc.citation.woscount	80	en_US
顯示於類別：	期刊論文