Full metadata record
DC FieldValueLanguage
dc.contributor.authorLi, Zhen-Yuen_US
dc.contributor.authorUen, Wu-Yihen_US
dc.contributor.authorLo, Ming-Huaen_US
dc.contributor.authorChiu, Ching-Huaen_US
dc.contributor.authorLin, Po-Chunen_US
dc.contributor.authorHung, Chih-Tsangen_US
dc.contributor.authorLu, Tien-Changen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorWang, Shing-Chungen_US
dc.contributor.authorHuang, Yen-Chinen_US
dc.date.accessioned2019-04-02T06:00:56Z-
dc.date.available2019-04-02T06:00:56Z-
dc.date.issued2009-01-01en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3033401en_US
dc.identifier.urihttp://hdl.handle.net/11536/149713-
dc.description.abstractIn this paper, we report the fabrication of an In0.2Ga0.8N/GaN multiple-quantum-well (MQW) structure on vicinal sapphire substrates with a very small offset angle of 0-1 degrees by low-pressure metallorganic chemical vapor deposition. Our study demonstrates that the quality of the In0.2Ga0.8N/GaN MQW structure is very sensitive to the offset angle of the vicinal substrate. High-resolution X-ray diffraction analyses demonstrated high-order satellite peaks and clear fringes between them for all MQW structures fabricated, from which the interface roughness (IRN) was estimated. The IRN of the In0.2Ga0.8N/GaN MQW structure fabricated on 0.2 degrees off sapphire substrate was determined as 1.36% of the quantum well layer period. Besides, reciprocal lattice mapping was employed to examine the strain status of the MQW. The lattice relaxation of the same specimen mentioned above was estimated to be 7.4x10(-5). It is therefore manifested that an In0.2Ga0.8N/GaN MQW structure with abrupt interfaces and good layer periodicity was grown. From it, a shortest radiative lifetime of 14.2 ns and a lowest fluctuation of 5.6 meV in the emission energy of micro-photoluminescence mapping were achieved. In addition, superior material qualities of the whole film fabricated on 0.2 degrees off substrate were recognized by cross-sectional transmission electron microscopy. Based on the results mentioned above, a high-quality In0.2Ga0.8N/GaN MQW blue light, emitting diode (LED) has been fabricated on 0.2 degrees off substrate, which demonstrated a strong room-temperature electroluminescence emission at the wavelength of 465 nm and with the full width at half maximum of only 19 nm. The same device also showed an output power of 13.4 mW and an external quantum efficiency of 19.2%. Both these characteristics are improved drastically compared with the devices fabricated on the substrates with other offset angles. Conclusively, the use of an appropriately misoriented sapphire substrate is suggested to be effective for elevating the emission efficiency of In0.2Ga0.8N/GaN MQW blue LED fabricated thereon.en_US
dc.language.isoen_USen_US
dc.subjectelectroluminescenceen_US
dc.subjectgallium compoundsen_US
dc.subjectIII-V semiconductorsen_US
dc.subjectindium compoundsen_US
dc.subjectinterface roughnessen_US
dc.subjectlight emitting diodesen_US
dc.subjectMOCVDen_US
dc.subjectradiative lifetimesen_US
dc.subjectsemiconductor quantum wellsen_US
dc.subjecttransmission electron microscopyen_US
dc.subjectwide band gap semiconductorsen_US
dc.subjectX-ray diffractionen_US
dc.titleEnhancing the Emission Efficiency of In0.2Ga0.8N/GaN MQW Blue LED by Using Appropriately Misoriented Sapphire Substratesen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3033401en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume156en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000261973600043en_US
dc.citation.woscount5en_US
Appears in Collections:Articles