完整後設資料紀錄
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dc.contributor.authorLin, Sheng-Chiehen_US
dc.contributor.authorChiu, Yu-Fanen_US
dc.contributor.authorWu, Pu-Weien_US
dc.contributor.authorHsieh, Yi-Fanen_US
dc.contributor.authorWu, Cheng-Yeouen_US
dc.date.accessioned2019-04-02T05:58:35Z-
dc.date.available2019-04-02T05:58:35Z-
dc.date.issued2010-10-01en_US
dc.identifier.issn0884-2914en_US
dc.identifier.urihttp://dx.doi.org/10.1557/JMR.2010.0248en_US
dc.identifier.urihttp://hdl.handle.net/11536/150056-
dc.description.abstractWe fabricated a nanostructured brush by carrying out Ni deposition on a through-channel anodic aluminum oxide (AAO) template, followed by removal of the AAO skeleton. The AAO was prepared by a two-step anodization process resulting in pore diameter and thickness of 350 nm and 40 mu m, respectively. Subsequently, the AAO underwent an electroless deposition involving sensitization, activation, and Ni plating, in conjunction with polyethylene glycol used as the inhibitor to prevent premature closing of pore opening. After deliberate control in relevant parameters, we obtained a conformal Ni overcoat along every pore channel leading to a reduced average pore diameter of 78 nm. Afterward, the sample was immersed in a KOH solution to remove the AAO structure, forming freestanding Ni tubules in a brush configuration. The nanostructured brush revealed considerable enhancement for hydrogen evolution reaction in both current-potential polarization and galvanostatic measurements, which were attributed to the increment in apparent surface area.en_US
dc.language.isoen_USen_US
dc.titleTemplated fabrication of nanostructured Ni brush for hydrogen evolution reactionen_US
dc.typeArticleen_US
dc.identifier.doi10.1557/JMR.2010.0248en_US
dc.identifier.journalJOURNAL OF MATERIALS RESEARCHen_US
dc.citation.volume25en_US
dc.citation.spage2001en_US
dc.citation.epage2007en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000282494500017en_US
dc.citation.woscount6en_US
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