標題: | Laser, buffer layer and CoCrPtOx-assisted low temperature fabrication process of a small-sized-CNT pattern by MPCVD |
作者: | Teng, I-Ju Hong, Tsai-Hau Hsu, Hui-Lin Jian, Sheng-Rui Wang, Wei-Hsiang Kuo, Cheng-Tzu 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Small-sized-CNT pattern;Buffer layer;CoCrPtOx catalyst precursor;Microwave plasma chemical vapor deposition (MPCVD);Selective local laser heating |
公開日期: | 1-Oct-2010 |
摘要: | For improving compatibility with IC processes, this work presents a low temperature process (<400 degrees C) to fabricate a small-sized-carbon nanotube (CNT) (<6 graphene layers) pattern by buffer layer (AlN) and CoCrPtOx catalyst precursor-assisted microwave plasma chemical vapor deposition (MPCVD). Without high temperature heating on the whole specimen, the low temperature process mainly results from selective local activation laser heating (>= 600 degrees C) to form the catalyst nanostructures, which are beneficial to low temperature H-plasma treatment to form catalyst nanoparticles for CNT growth. The functions of the buffer layer and the catalyst precursor are to help the heat dissipation and the small-sized CNT formation. (C) 2010 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2010.04.110 http://hdl.handle.net/11536/150079 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2010.04.110 |
期刊: | THIN SOLID FILMS |
Volume: | 518 |
起始頁: | 7348 |
結束頁: | 7351 |
Appears in Collections: | Articles |