Full metadata record
DC FieldValueLanguage
dc.contributor.authorLiu, Yen-Tingen_US
dc.contributor.authorChen, San-Yuanen_US
dc.contributor.authorLee, Hsin-Yien_US
dc.date.accessioned2019-04-02T06:00:19Z-
dc.date.available2019-04-02T06:00:19Z-
dc.date.issued2010-10-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tsf.2010.05.003en_US
dc.identifier.urihttp://hdl.handle.net/11536/150081-
dc.description.abstractBiFeO3 (BFO) films were grown on LaNiO3-coated Si substrate by a RF magnetron sputtering system at temperatures in the range of 300-700 degrees C. X-ray reflectivity and high-resolution diffraction measurements were employed to characterize the microstructure of these films. For a substrate temperature below 300 degrees C and at 700 degrees C only partially crystalline films and completely randomly polycrystalline films were grown, whereas highly (001)-orientated BFO film was obtained for a substrate temperature in the range of 400-600 degrees C. The crystalline quality of BFO thin films increase as the deposition temperature increase except for the film deposited at 700 degrees C. The fitted result from X-ray reflectivity curves show that the densities of the BFO films are slightly less than their bulk values. For the BFO films deposited at 300-600 degrees C, the higher the deposition temperature, the larger the remnant polarization and surface roughness of the films present. (C) 2010 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectX-ray diffractionen_US
dc.subjectThin filmsen_US
dc.subjectRF sputteringen_US
dc.titleCharacteristics of highly orientated BiFeO3 thin films on a LaNiO3-coated Si substrate by RF sputteringen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.tsf.2010.05.003en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume518en_US
dc.citation.spage7412en_US
dc.citation.epage7415en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department加速器光源科技與應用學位學程zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentMaster and Ph.D. Program for Science and Technology of Accelrrator Light Sourceen_US
dc.identifier.wosnumberWOS:000282915100054en_US
dc.citation.woscount3en_US
Appears in Collections:Articles