Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Liu, Yen-Ting | en_US |
dc.contributor.author | Chen, San-Yuan | en_US |
dc.contributor.author | Lee, Hsin-Yi | en_US |
dc.date.accessioned | 2019-04-02T06:00:19Z | - |
dc.date.available | 2019-04-02T06:00:19Z | - |
dc.date.issued | 2010-10-01 | en_US |
dc.identifier.issn | 0040-6090 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.tsf.2010.05.003 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/150081 | - |
dc.description.abstract | BiFeO3 (BFO) films were grown on LaNiO3-coated Si substrate by a RF magnetron sputtering system at temperatures in the range of 300-700 degrees C. X-ray reflectivity and high-resolution diffraction measurements were employed to characterize the microstructure of these films. For a substrate temperature below 300 degrees C and at 700 degrees C only partially crystalline films and completely randomly polycrystalline films were grown, whereas highly (001)-orientated BFO film was obtained for a substrate temperature in the range of 400-600 degrees C. The crystalline quality of BFO thin films increase as the deposition temperature increase except for the film deposited at 700 degrees C. The fitted result from X-ray reflectivity curves show that the densities of the BFO films are slightly less than their bulk values. For the BFO films deposited at 300-600 degrees C, the higher the deposition temperature, the larger the remnant polarization and surface roughness of the films present. (C) 2010 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | X-ray diffraction | en_US |
dc.subject | Thin films | en_US |
dc.subject | RF sputtering | en_US |
dc.title | Characteristics of highly orientated BiFeO3 thin films on a LaNiO3-coated Si substrate by RF sputtering | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.tsf.2010.05.003 | en_US |
dc.identifier.journal | THIN SOLID FILMS | en_US |
dc.citation.volume | 518 | en_US |
dc.citation.spage | 7412 | en_US |
dc.citation.epage | 7415 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | 加速器光源科技與應用學位學程 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.contributor.department | Master and Ph.D. Program for Science and Technology of Accelrrator Light Source | en_US |
dc.identifier.wosnumber | WOS:000282915100054 | en_US |
dc.citation.woscount | 3 | en_US |
Appears in Collections: | Articles |