Title: Designs for optimizing depth of focus and spot size for UV laser ablation
Authors: Wei, An-Chi
Sze, Jyh-Rou
Chern, Jyh-Long
光電工程學系
Department of Photonics
Issue Date: 1-Nov-2010
Abstract: The proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.
URI: http://dx.doi.org/10.1007/s00339-010-5834-6
http://hdl.handle.net/11536/150087
ISSN: 0947-8396
DOI: 10.1007/s00339-010-5834-6
Journal: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume: 101
Begin Page: 411
End Page: 416
Appears in Collections:Articles