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dc.contributor.authorWu, CCen_US
dc.contributor.authorLin, CJen_US
dc.date.accessioned2014-12-08T15:02:54Z-
dc.date.available2014-12-08T15:02:54Z-
dc.date.issued1996-01-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/11536/1500-
dc.description.abstractThe free-carrier absorption in n-type GaAs films has been investigated for quantum well structures fabricated from III-V semiconducting materials where polar optical phonon scattering is predominant. Attention is given mainly to the case where the electromagnetic radiation is polarized in the layer plane, and the processes involving both emission and absorption of polar optical phonons. The energy band of electrons in semiconductors is assumed to be nonparabolic. Results are shown that the free-carrier absorption coefficient in n-type GaAs films depends upon the photon frequency, the width of the quantum wells, and temperature. However, in the small quantum well region such as the width of quantum wells d<30 Angstrom, the free-carrier absorption coefficient will be independent of temperature. Moreover, the free-carrier absorption coefficient oscillates with the width of quantum wells for larger quantum wells. (C) 1996 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleFree-carrier absorption in n-type gallium arsenide films for polar optical phonon scatteringen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume79en_US
dc.citation.issue2en_US
dc.citation.spage781en_US
dc.citation.epage785en_US
dc.contributor.department應用數學系zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentDepartment of Applied Mathematicsen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1996TQ77500032-
dc.citation.woscount9-
Appears in Collections:Articles