Full metadata record
DC FieldValueLanguage
dc.contributor.authorHuang, Wen-Feien_US
dc.contributor.authorRaghunath, P.en_US
dc.contributor.authorLin, M. C.en_US
dc.date.accessioned2019-04-02T05:59:51Z-
dc.date.available2019-04-02T05:59:51Z-
dc.date.issued2011-04-30en_US
dc.identifier.issn0192-8651en_US
dc.identifier.urihttp://dx.doi.org/10.1002/jcc.21686en_US
dc.identifier.urihttp://hdl.handle.net/11536/150261-
dc.description.abstractThis study investigates the adsorption and reactions of H2O2 on TiO2 anatase (101) and rutile (110) surfaces by first-principles calculations based on the density functional theory in conjunction with the projected augmented wave approach, using PW91, PBE, and revPBE functionals. Adsorption mechanisms of H2O2 and its fragments on both surfaces are analyzed. It is found that H2O2, H2O, and HO preferentially adsorb at the Ti-5c site, meanwhile HOO, O, and H preferentially adsorb at the (O-2c)(Ti-5c), (Ti-5c)(2), and O-2c sites, respectively. Potential energy profiles of the adsorption processes on both surfaces have been constructed using the nudged elastic band method. The two restructured surfaces, the 1/3 ML oxygen covered TiO2 and the hydroxylated TiO2, are produced with the H2O2 dehydration and deoxidation, respectively. The formation of main products, H2O(g) and the 1/3 ML oxygen covered TiO2 surface, is exothermic by 2.8 and 5.0 kcal/mol, requiring energy barriers of 0.8 and 1.1 kcal/mol on the rutile (110) and anatase (101) surface, respectively. The rate constants for the H2O2 dehydration processes have been predicted to be 6.65 x 10(-27) T-4.38 exp(-0.14 kcal mol(-1)/RT) and 3.18 x 10(-23) T-5.60 exp(-2.92 kcal mol(-1)/RT) respectively, in units of cm(3) molecule(-1) s(-1). (C) 2010 Wiley Periodicals, Inc. J Comput Chem 32: 1065-1081, 2011en_US
dc.language.isoen_USen_US
dc.subjectH2O2en_US
dc.subjectTiO2en_US
dc.subjectDFTen_US
dc.subjectreaction pathwayen_US
dc.subjectrate constanten_US
dc.titleComputational Study on the Reactions of H2O2 on TiO2 Anatase (101) and Rutile (110) Surfacesen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/jcc.21686en_US
dc.identifier.journalJOURNAL OF COMPUTATIONAL CHEMISTRYen_US
dc.citation.volume32en_US
dc.citation.spage1065en_US
dc.citation.epage1081en_US
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000288401000006en_US
dc.citation.woscount29en_US
Appears in Collections:Articles