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dc.contributor.authorChung, Wan-Fangen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorLi, Hung-Weien_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorChen, Yu-Chunen_US
dc.contributor.authorTseng, Tseung-Yuenen_US
dc.contributor.authorTai, Ya-Hsiangen_US
dc.date.accessioned2019-04-02T05:59:49Z-
dc.date.available2019-04-02T05:59:49Z-
dc.date.issued2011-01-01en_US
dc.identifier.issn1099-0062en_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3568831en_US
dc.identifier.urihttp://hdl.handle.net/11536/150273-
dc.description.abstractThis paper investigates the environmental effects and related adsorbent species reactions on sol-gel derived amorphous indium gallium zinc oxide thin film transistors (a-IGZO TFTs). The discrepancy between device characteristics measured in atmospheric and vacuum conditions was clarified through experiments with thermal annealing and different gas partial pressures. The measurement of a-IGZO TFTs in simulated water vapor environment was also utilized. We verified that the adsorbed water originating from the surrounding atmosphere can cause an increase in off-current and also enhance more oxygen molecule adsorption on the exposed back-channel surface, leading to more serious degradation in on-current. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3568831] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleH2O-Assisted O-2 Adsorption in Sol-Gel Derived Amorphous Indium Gallium Zinc Oxide Thin Film Transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3568831en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.citation.volume14en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000289165400021en_US
dc.citation.woscount13en_US
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