標題: | Improved resistive switching properties of Ti/ZrO2/Pt memory devices for RRAM application |
作者: | Wang, Sheng-Yu Tsai, Chen-Han Lee, Dai-Ying Lin, Chih-Yang Lin, Chun-Chieh Tseng, Tseung-Yuen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Nonvolatile memory;RRAM;ZrO2;Resistive switching |
公開日期: | 1-七月-2011 |
摘要: | In this study, we have investigated the effect of current compliance during forming process on resistive switching (RS) characteristics of the Ti/ZrO2/Pt device. The higher the current compliance is, the larger RS operation voltage is needed. The Ti/ZrO2/Pt device with high device yield can be operated over 10,000 RS cycles by sweeping dc voltage. and the on and off two memory states exhibit good stability under 0.3 V stress voltage. Moreover, the data retention of both memory states is over 10(5) s. As applying +6-V 10-ns and -3-V 10-ns voltage pulses on the device, there are operation errors observed during continuous write-read-erase-read cycles until increasing the pulse width to 50 ns. Nondestructive readout tests are also performed on the Ti/ZrO2/Pt device before and after 10(3) pulse cycles without any obvious degradation observed. Compared with reported ZrO2-based memory devices, our Ti/ZrO2/Pt device exhibits better RS properties and has a high potential for memory application. (C) 2011 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.mee.2010.11.058 http://hdl.handle.net/11536/150340 |
ISSN: | 0167-9317 |
DOI: | 10.1016/j.mee.2010.11.058 |
期刊: | MICROELECTRONIC ENGINEERING |
Volume: | 88 |
起始頁: | 1628 |
結束頁: | 1632 |
顯示於類別: | 期刊論文 |