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dc.contributor.authorHuang, Wen-Hengen_US
dc.contributor.authorLee, Chi-Shenen_US
dc.date.accessioned2019-04-02T05:59:03Z-
dc.date.available2019-04-02T05:59:03Z-
dc.date.issued2011-11-01en_US
dc.identifier.issn0966-9795en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.intermet.2011.07.016en_US
dc.identifier.urihttp://hdl.handle.net/11536/150378-
dc.description.abstractTernary compounds Hf-13.0Ni40.8Ga30.9 and Zr13.0Ni40.6Ga31.0 were synthesized from the pure elements in arc-melting reactions; their structures were characterized through X-ray diffraction of single crystals. Each compound adopts a hexagonal structure of type Y13Pd40Sn31 and crystallizes in space group P6/mmm (No. 191). The cell parameters of Hf13.0Ni40.8Ga30.9 are a = 17.895(3)angstrom; c = 8.2434(16)angstrom; V=2286.0(6) angstrom(3); R-1/wR(2)= 0.0299/0.0598. The cell parameters of Zr13.0Ni40.6Ga31.0 are a= 17.964(3) angstrom; c = 8.2757(17) angstrom; V= 2312.7(7) angstrom(3); R-1/wR(2) = 0.0348/0.0686. These structures comprise polyhedra with diverse coordination numbers - Hf 12-15, Ni and Ga 6-12. Analysis of the structures reveals layer frameworks based on structures of type CaCus, accompanied with atomic substitution and elimination on the layers and decreased values of the concentration of valence electrons. Calculated electronic structures reveal a strong contribution from a Ni-Ga interaction and the characteristics of a polar interrnetallic phase. (C) 2011 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectintermetallics, ternary alloy systemsen_US
dc.subjectcrystal chemistry of intermetallicsen_US
dc.subjectcrystallographyen_US
dc.subjectelectronic structure, calculationen_US
dc.titleTernary intermetallics Hf13.0Ni40.8Ga30.9 and Zr13.0Ni40.6Ga31.0en_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.intermet.2011.07.016en_US
dc.identifier.journalINTERMETALLICSen_US
dc.citation.volume19en_US
dc.citation.spage1635en_US
dc.citation.epage1641en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000295431400001en_US
dc.citation.woscount0en_US
Appears in Collections:Articles