Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chiu, Yu-Sheng | en_US |
dc.contributor.author | Huang, Jui-Chien | en_US |
dc.contributor.author | Lin, Tai-Ming | en_US |
dc.contributor.author | Chou, Yu-Ting | en_US |
dc.contributor.author | Lu, Chung-Yu | en_US |
dc.contributor.author | Chang, Chia-Ta | en_US |
dc.contributor.author | Chang, Edward Yi | en_US |
dc.date.accessioned | 2019-04-02T06:04:19Z | - |
dc.date.available | 2019-04-02T06:04:19Z | - |
dc.date.issued | 2012-01-01 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/150573 | - |
dc.description.abstract | We present the Rf characteristics of 0.7-mu m gate length n-GaN/AlGaN/GaN high-electron mobility transistors (HEMTs) with different source-drain spacing tested under different temperatures.. The 7-mu m source-drain spacing device demonstrated 800 mA/mm drain current density and 257 mS/mm tranceconductance, and the 5-mu m source-drain spacing device demonstrated 700 mA/mm drain current density and 260 mS/mm tranconductance. The 7-mu m source-drain spacing device was measured at room temperatures of 25 degrees C and -40 degrees C, the current gain (f(T)) were 18 GHz and 21GHz and the maximum oscillation (f(max)(U)) frequency were 63 GHz-and 87 GHz, respectively The f(T) was nearly linearly dependent on the temperature. As operating temperature increased from -40 degrees C to 50 degrees C, the f(T) dropped more dramatically for the 5-mu m SD spacing device than for the 7-mu m device. The f(max) characteristic of 5-mu m SD spacing device decreases more dramatically above 125 degrees C than the 7-mu m SD spacing device. This phenomenon might be due to stronger phonon scattering for shorter channel device at high temperatures. | en_US |
dc.language.iso | en_US | en_US |
dc.title | RF Characteristics of AlGaN/GaN HEMTs under Different Temperatures | en_US |
dc.type | Proceedings Paper | en_US |
dc.identifier.journal | 2012 10TH IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS (ICSE) | en_US |
dc.citation.spage | 411 | en_US |
dc.citation.epage | 413 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000316563400098 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Conferences Paper |