完整後設資料紀錄
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dc.contributor.authorWang, Chunen_US
dc.contributor.authorHsu, Heng-Tungen_US
dc.contributor.authorHuang, Ting-Juien_US
dc.contributor.authorFan, Jun-Kaien_US
dc.contributor.authorChang, Edward Yien_US
dc.date.accessioned2019-04-02T06:04:20Z-
dc.date.available2019-04-02T06:04:20Z-
dc.date.issued2018-01-01en_US
dc.identifier.urihttp://hdl.handle.net/11536/151001-
dc.description.abstractThe effect of the AlN spacer on the performance of AlGaN/GaN HEMT devices at 38 GHz is experimentally investigated. The measurement results revealed that the device with spacer showed superior performance in terms of the maximum drain current. RF wise, substantial improvement in the cut-off frequency and the maximum oscillation frequency was also observed for devices with spacer. A saturated output power density of 4.21 W/mm with 35.02% power-added efficiency (PAE) at 38 GHz were achieved for device with 70nm gate length.en_US
dc.language.isoen_USen_US
dc.subjectAlN spaceren_US
dc.subjectAlGaN/GaNen_US
dc.subjectHEMTen_US
dc.subjectcut-off frequencyen_US
dc.subjectmaximum oscillation frequencyen_US
dc.titleEffect of AlN Spacer on the AlGaN/GaN HEMT Device Performance at Millimeter-wave Frequenciesen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2018 ASIA-PACIFIC MICROWAVE CONFERENCE PROCEEDINGS (APMC)en_US
dc.citation.spage1208en_US
dc.citation.epage1210en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department國際半導體學院zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentInternational College of Semiconductor Technologyen_US
dc.identifier.wosnumberWOS:000457599800399en_US
dc.citation.woscount0en_US
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