完整後設資料紀錄
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dc.contributor.authorLi, Zong-Linen_US
dc.contributor.authorLin, Shen-Chiehen_US
dc.contributor.authorLin, Grayen_US
dc.contributor.authorCheng, Hui-Wenen_US
dc.contributor.authorSun, Kien-Wenen_US
dc.contributor.authorLee, Chien-Pingen_US
dc.date.accessioned2019-05-02T00:25:49Z-
dc.date.available2019-05-02T00:25:49Z-
dc.date.issued2019-03-14en_US
dc.identifier.issn2072-666Xen_US
dc.identifier.urihttp://dx.doi.org/10.3390/mi10030188en_US
dc.identifier.urihttp://hdl.handle.net/11536/151582-
dc.description.abstractWe study the effect of etching depth on the threshold characteristics of GaSb-based middle infrared (Mid-IR) photonic-crystal surface-emitting lasers (PCSELs) with different lattice periods. The below-threshold emission spectra are measured to identify the bandgap as well as band-edge modes. Moreover, the bandgap separation widens with increasing etching depth as a result of enhanced diffraction feedback coupling. However, the coupling is nearly independent of lattice period. The relationship between threshold gain and Bragg detuning is also experimentally determined for PCSELs and is similar to that calculated theoretically for one-dimensional distributed feedback lasers.en_US
dc.language.isoen_USen_US
dc.subjectphotonic crystalsen_US
dc.subjectsurface-emitting lasersen_US
dc.subjectmiddle infrared lasersen_US
dc.subjectGaSb-based lasersen_US
dc.titleEffect of Etching Depth on Threshold Characteristics of GaSb-Based Middle Infrared Photonic-Crystal Surface-Emitting Lasersen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/mi10030188en_US
dc.identifier.journalMICROMACHINESen_US
dc.citation.volume10en_US
dc.citation.issue3en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.identifier.wosnumberWOS:000464418700001en_US
dc.citation.woscount0en_US
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