完整後設資料紀錄
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dc.contributor.authorWu, Yung-Chien_US
dc.contributor.authorChang, Ning-Anen_US
dc.contributor.authorYang, Tsung-Hanen_US
dc.contributor.authorTsai, Chih-Yaen_US
dc.contributor.authorChen, Hou-Renen_US
dc.contributor.authorHsieh, Wen-Fengen_US
dc.date.accessioned2019-05-02T00:25:58Z-
dc.date.available2019-05-02T00:25:58Z-
dc.date.issued2019-03-01en_US
dc.identifier.issn0091-3286en_US
dc.identifier.urihttp://dx.doi.org/10.1117/1.OE.58.3.037106en_US
dc.identifier.urihttp://hdl.handle.net/11536/151691-
dc.description.abstractDifferent well widths of m-plane Mg0.19Zn0.81O/ZnO multiple quantum wells (MQWs) have been fabricated on the two-step pregrown MgZnO-buffered m-plane sapphires by a pulsed laser deposition and have a narrower linewidth on x-ray diffraction than ZnO-buffered MQWs. By using the variation method to calculate the band diagram and by corroborating the results of temperature-dependent photoluminescence, we confirm the binding energies of free exciton and basal-stacking-fault-bound exciton, which is composed of electrons in the barrier and confined hole in the narrow-width MQWs. The coupling of A1(LO) phonon with excitons in m-MQWs shows more sensitivity toward a decrease in well width than E2(low), due to the crystal symmetry and the reduced Bohr radius. (C) 2019 Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.language.isoen_USen_US
dc.subjectZnOen_US
dc.subjectnonpolaren_US
dc.subjectbasal stacking faulten_US
dc.subjectm-planeen_US
dc.titleInfluence of basal stacking faults on luminescence of m-plane Mg0.19Zn0.81O/ZnO quantum wells grown on a two-step MgZnO-buffer layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1117/1.OE.58.3.037106en_US
dc.identifier.journalOPTICAL ENGINEERINGen_US
dc.citation.volume58en_US
dc.citation.issue3en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電機學院zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000463893600038en_US
dc.citation.woscount0en_US
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