完整後設資料紀錄
DC 欄位語言
dc.contributor.authorVan-Truong Nguyenen_US
dc.contributor.authorYang, Tzu-Yien_US
dc.contributor.authorPhuoc Anh Leen_US
dc.contributor.authorYen, Po-Jenen_US
dc.contributor.authorChueh, Yu-Lunen_US
dc.contributor.authorWei, Kung-Hwaen_US
dc.date.accessioned2019-06-03T01:08:33Z-
dc.date.available2019-06-03T01:08:33Z-
dc.date.issued2019-04-24en_US
dc.identifier.issn1944-8244en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acsami.9b01374en_US
dc.identifier.urihttp://hdl.handle.net/11536/151925-
dc.description.abstractDoping nonmetal atoms into layered transition metal dichalcogenide MX2 structures has emerged as a promising strategy for enhancing their catalytic activities for the hydrogen evolution reaction. In this study, we developed a new and efficient one-step approach that involves simultaneous plasma-induced doping and exfoliating of MX2 bulk into nanosheets-such as MoSe2, WSe2, MoS2, and WS2 nano sheets-within a short time and at a low temperature (ca. 80 degrees C). Specifically, by utilizing active plasma that is generated with an asymmetric electrical field during the electrochemical reaction at the surface of the submerged cathode tip, we are able to achieve doping of nitrogen atoms, from the electrolytes, into the semiconducting 2H-MX2 structures during their exfoliation process from the bulk states, forming N-doped MX2. We selected N-doped MoS2 nanosheets for demonstrating their catalytic hydrogen evolution potential. We modulated the electronic and transport properties of the MoS2 structure with the synergy of nitrogen doping and exfoliating for enhancing their catalytic activity. We found that the nitrogen concentration of 5.2 atom % at N-doped MoS2 nanosheets have an excellent catalytic hydrogen evolution reaction, where a low overpotential of 164 mV at a current density of 10 mA cm(-2) and a small Tafel slope of 71 dec mV(-1)-much lower than those of exfoliated MoS2 nanosheets (207 mV, 82 dec mV(-1)) and bulk MoS2 (602 mV, 198 dec mV(-1))-as well as an extraordinary long-term stability of >25 h in 0.5 M H2SO4 can be achieved.en_US
dc.language.isoen_USen_US
dc.subjecttransition metal dichalcogenides MoS2en_US
dc.subjectWS2en_US
dc.subjectMoSe2en_US
dc.subjectWSe2en_US
dc.subjectsimultaneous exfoliation and nitrogen dopingen_US
dc.subjectnitrogen-doped MoS2en_US
dc.subjecthydrogen evolution reactionen_US
dc.subjectelectrocatalysten_US
dc.titleNew Simultaneous Exfoliation and Doping Process for Generating MX2 Nanosheets for Electrocatalytic Hydrogen Evolution Reactionen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/acsami.9b01374en_US
dc.identifier.journalACS APPLIED MATERIALS & INTERFACESen_US
dc.citation.volume11en_US
dc.citation.issue16en_US
dc.citation.spage14786en_US
dc.citation.epage14795en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000466052800029en_US
dc.citation.woscount1en_US
顯示於類別:期刊論文