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dc.contributor.authorChen, Chia-Minen_US
dc.contributor.authorLiu, Chih-Mingen_US
dc.contributor.authorWei, Kung-Hwaen_US
dc.contributor.authorJeng, U-Seren_US
dc.contributor.authorSu, Chiu-Hunen_US
dc.date.accessioned2014-12-08T15:21:28Z-
dc.date.available2014-12-08T15:21:28Z-
dc.date.issued2012-01-14en_US
dc.identifier.issn0959-9428en_US
dc.identifier.urihttp://dx.doi.org/10.1039/c1jm13936cen_US
dc.identifier.urihttp://hdl.handle.net/11536/15256-
dc.description.abstractIn this study, we fabricated p-channel-type non-volatile organic field-effect transistor (OFET) memory devices featuring an asymmetric PS-b-P4VP diblock copolymer layer incorporating high- and low-work-function metal nanoparticles (NPs) in the hydrophilic and hydrophobic blocks, respectively. We chose the highly asymmetric diblock copolymer PS(56k)-b-P4VP(8k) as the polymer electret to create the memory windows, and used the different work functions of the ex situ-synthesized metal NPs to tune the memory window for either p- or n-channel applications. The transfer curves of non-volatile OFET memory devices incorporating an asymmetric PS(56k)-b-P4VP8k layer embedded with high-work-function Pt NPs (5.65 eV) in the P4VP block exhibited a positive threshold voltage shift and a large memory window (ca. 27 V). In contrast, the transfer curves of the corresponding non-volatile OFET memory devices featuring embedded low-work-function (4.26 eV) Ag NPs exhibited a negative threshold voltage shift and a smaller memory window (ca. 19 V). This approach provides a versatile way to fabricate p- or possibly n-channel-type non-volatile organic field-effect transistor (OFET) memory devices with the same processing procedure.en_US
dc.language.isoen_USen_US
dc.titleNon-volatile organic field-effect transistor memory comprising sequestered metal nanoparticles in a diblock copolymer filmen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c1jm13936cen_US
dc.identifier.journalJOURNAL OF MATERIALS CHEMISTRYen_US
dc.citation.volume22en_US
dc.citation.issue2en_US
dc.citation.spage454en_US
dc.citation.epage461en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000299020000026-
dc.citation.woscount17-
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