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dc.contributor.authorPark, Juyeonen_US
dc.contributor.authorKim, Ju-Hyungen_US
dc.contributor.authorBak, Sunmien_US
dc.contributor.authorTahara, Kazukunien_US
dc.contributor.authorJung, Jaehoonen_US
dc.contributor.authorKawai, Makien_US
dc.contributor.authorTobe, Yoshitoen_US
dc.contributor.authorKim, Yousooen_US
dc.date.accessioned2019-09-02T07:46:13Z-
dc.date.available2019-09-02T07:46:13Z-
dc.date.issued2019-07-08en_US
dc.identifier.issn1433-7851en_US
dc.identifier.urihttp://dx.doi.org/10.1002/anie.201904290en_US
dc.identifier.urihttp://hdl.handle.net/11536/152618-
dc.description.abstractChiral structures created through the adsorption of molecules onto achiral surfaces play pivotal roles in many fields of science and engineering. Here, we present a systematic study of a novel chiral phenomenon on a surface in terms of organizational chirality, that is, meso-isomerism, through coverage-driven hierarchical polymorphic transitions of supramolecular assemblies of highly symmetric pi-conjugated molecules. Four coverage-dependent phases of dehydrobenzo[12]annulene were uniformly fabricated on Ag(111), exhibiting unique chiral characteristics from the single-molecule level to two-dimensional supramolecular assemblies. All coverage-driven phase transitions stem from adsorption-induced pseudo-diastereomerism, and our observation of a lemniscate-type (infinity) supramolecular configuration clearly reveals a drastic chiral phase transition from an enantiomeric chiral domain to a meso-isomeric achiral domain. These findings provide new insights into controlling two-dimensional chiral architectures on surfaces.en_US
dc.language.isoen_USen_US
dc.subjectchiralityen_US
dc.subjectnanostructuresen_US
dc.subjectscanning tunneling microscopyen_US
dc.subjectself-assemblyen_US
dc.subjectsurface chemistryen_US
dc.titleOn-Surface Evolution of meso-Isomerism in Two-Dimensional Supramolecular Assembliesen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/anie.201904290en_US
dc.identifier.journalANGEWANDTE CHEMIE-INTERNATIONAL EDITIONen_US
dc.citation.volume58en_US
dc.citation.issue28en_US
dc.citation.spage9611en_US
dc.citation.epage9618en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000476610900050en_US
dc.citation.woscount0en_US
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