完整後設資料紀錄
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dc.contributor.authorWinestook, Rachel Onnen_US
dc.contributor.authorSaguy, Cecileen_US
dc.contributor.authorMa, Chun-Haoen_US
dc.contributor.authorChu, Ying-Haoen_US
dc.contributor.authorIvry, Yachinen_US
dc.date.accessioned2019-09-02T07:46:17Z-
dc.date.available2019-09-02T07:46:17Z-
dc.date.issued1970-01-01en_US
dc.identifier.issn2199-160Xen_US
dc.identifier.urihttp://dx.doi.org/10.1002/aelm.201900428en_US
dc.identifier.urihttp://hdl.handle.net/11536/152672-
dc.description.abstractMuch attention has recently been given to flexible and wearable integrated electronic devices, with a strong emphasis on real-time sensing, computing, and communication technologies. Thin ferroelectric films exhibit switchable polarization and strong electromechanical coupling, and hence are in widespread use in such technologies, albeit not when flexed. Effects of extrinsic strain on thin ferroelectric films are still unclear, mainly due to the lack of suitable experimental systems that allow cross structural-functional characterization with in situ straining. Moreover, although the effects of intrinsic strain on ferroelectric films, e.g., due to film-substrate lattice mismatch, have been extensively investigated, it is unclear how these effects are influenced by external strain. A method to strain thin films homogenously in situ is developed, allowing structural characterization as well as functional switching and piezorsponse measurements at the nanoscale, while retaining the sample under constant straining conditions. Using this method, thin films of PbZr0.2Ti0.8O3, which were grown on a flexible mica substrate, are strained to reduce substrate clamping effects and increase the tetragonality. Consequently, the domain stability is increased, the coercive field value is decreased, and imprint effects are reduced. This method also allows direct characterization of the relationship between the lattice parameters and nanoscale properties of other flexible materials.en_US
dc.language.isoen_USen_US
dc.subjectferroelectric stabilityen_US
dc.subjectflexible electronicsen_US
dc.subjectin situ AFMen_US
dc.subjectnanodomainsen_US
dc.subjectnanoscale strainen_US
dc.titleEnhanced Ferroelectric Functionality in Flexible Lead Zirconate Titanate Films with In Situ Substrate-Clamping Compensationen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/aelm.201900428en_US
dc.identifier.journalADVANCED ELECTRONIC MATERIALSen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000477393900001en_US
dc.citation.woscount0en_US
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