標題: Synergy of Dopants and Defects in Graphitic Carbon Nitride with Exceptionally Modulated Band Structures for Efficient Photocatalytic Oxygen Evolution
作者: Zhao, Doming
Dong, Chung-Li
Bin Wang
Chen, Chao
Huang, Yu-Cheng
Diao, Zhidan
Li, Shuzhou
Guo, Liejin
Shen, Shaohua
電子物理學系
Department of Electrophysics
關鍵字: boron dopants;graphitic carbon nitride;nitrogen defects;photocatalytic oxygen evolution
公開日期: 1-一月-1970
摘要: Electronic structure greatly determines the band structures and the charge carrier transport properties of semiconducting photocatalysts and consequently their photocatalytic activities. Here, by simply calcining the mixture of graphitic carbon nitride (g-C3N4) and sodium borohydride in an inert atmosphere, boron dopants and nitrogen defects are simultaneously introduced into g-C3N4. The resultant boron-doped and nitrogen-deficient g-C3N4 exhibits excellent activity for photocatalytic oxygen evolution, with highest oxygen evolution rate reaching 561.2 mu mol h(-1) g(-1), much higher than previously reported g-C3N4. It is well evidenced that with conduction and valence band positions substantially and continuously tuned by the simultaneous introduction of boron dopants and nitrogen defects into g-C3N4, the band structures are exceptionally modulated for both effective optical absorption in visible light and much increased driving force for water oxidation. Moreover, the engineered electronic structure creates abundant unsaturated sites and induces strong interlayer C-N interaction, leading to efficient electron excitation and accelerated charge transport. In the present work, a facile approach is successfully demonstrated to engineer the electronic structures and the band structures of g-C3N4 with simultaneous introduction of dopants and defects for high-performance photocatalytic oxygen evolution, which can provide informative principles for the design of efficient photocatalysis systems for solar energy conversion.
URI: http://dx.doi.org/10.1002/adma.201903545
http://hdl.handle.net/11536/152791
ISSN: 0935-9648
DOI: 10.1002/adma.201903545
期刊: ADVANCED MATERIALS
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