完整後設資料紀錄
DC 欄位語言
dc.contributor.authorLi, Yih-Langen_US
dc.contributor.authorLin, Shih-Tingen_US
dc.contributor.authorNishizawa, Shinichien_US
dc.contributor.authorSu, Hong-Yonen_US
dc.contributor.authorFong, Ming-Jieen_US
dc.contributor.authorChen, Oscaren_US
dc.contributor.authorOnodera, Hidetoshien_US
dc.date.accessioned2019-10-05T00:09:41Z-
dc.date.available2019-10-05T00:09:41Z-
dc.date.issued2019-01-01en_US
dc.identifier.isbn978-1-4503-6725-7en_US
dc.identifier.urihttp://dx.doi.org/10.1145/3316781.3317868en_US
dc.identifier.urihttp://hdl.handle.net/11536/152900-
dc.description.abstractFor 7nm technology node, cell placement with drain-to-drain abutment (DDA) requires additional filler cells, increasing placement area. This is the first work to fully automatically synthesize a DDA-aware cell library with optimized number of drains on cell boundary based on ASAP 7nm PDK. We propose a DDA-aware dynamic programming based transistor placement. Previous works ignore the use of M0 layer in cell routing. We firstly propose an ILP-based M0 routing planning. With M0 routing, the congestion of M1 routing can be reduced and the pin accessibility can be improved due to the diminished use of M2 routing. To improve the routing resource utilization, we propose an implicitly adjustable grid map, making the maze routing able to explore more routing solutions. Experimental results show that block placement using the DDA-aware cell library requires less filler cells than that using traditional cell library by 70.9%, which achieves a block area reduction rate of 5.7%.en_US
dc.language.isoen_USen_US
dc.titleNCTUcell: A DDA-Aware Cell Library Generator for FinFET Structure with Implicitly Adjustable Grid Mapen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1145/3316781.3317868en_US
dc.identifier.journalPROCEEDINGS OF THE 2019 56TH ACM/EDAC/IEEE DESIGN AUTOMATION CONFERENCE (DAC)en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department資訊工程學系zh_TW
dc.contributor.departmentDepartment of Computer Scienceen_US
dc.identifier.wosnumberWOS:000482058200120en_US
dc.citation.woscount0en_US
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