標題: | The Mechanical Property, Microstructure, and Pore Geometry of a Methyltrimethoxysilane Modified Silica Zeolite (MSZ) Film |
作者: | Che, Mu-Lung Chuang, Shindy Leu, Jihperng 材料科學與工程學系 Department of Materials Science and Engineering |
公開日期: | 2012 |
摘要: | A methyltrimethoxysilane (MTMS) modified silica zeolite (MSZ) film has been prepared using a high ratio of MTMS/tetraethyl orthosilicate (TEOS). This study investigated the effect of MTMS addition on the low-k matrix structure, elastic modulus, and pore geometry. High MTMS loading reduced the k-value of MSZ film down to 2.0, but yielded a lower elastic modulus, 2.7 GPa. Based on grazing-incidence small-angle X-ray scattering (GISAXS) 2D pattern analysis, the pore geometry of the MSZ film was found to be small but elliptical (R(in-plane) similar to 3.75 nm; R(out-of-plane) similar to 3.04 nm). The elliptical pore shape was formed by a collapse of film structure at 150-160 degrees C as a result of similar to 32% thickness shrinkage due to the decomposition of tetra-n-propylammonium hydroxide (TPAOH), a structure directing catalyst, and due to a large degree of crosslinking reaction in the silica matrix. Combining GISAXS, (29)Si-NMR, and FT-IR results, we propose that the lower elastic modulus was caused by the incorporation of a large amount of methyl groups from the MTMS precursor and the elliptic pores. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.074203jes] All rights reserved. |
URI: | http://hdl.handle.net/11536/15296 http://dx.doi.org/10.1149/2.074203jes |
ISSN: | 0013-4651 |
DOI: | 10.1149/2.074203jes |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 159 |
Issue: | 3 |
起始頁: | G23 |
結束頁: | G28 |
顯示於類別: | 期刊論文 |