Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Che, Mu-Lung | en_US |
dc.contributor.author | Chuang, Shindy | en_US |
dc.contributor.author | Leu, Jihperng | en_US |
dc.date.accessioned | 2014-12-08T15:21:32Z | - |
dc.date.available | 2014-12-08T15:21:32Z | - |
dc.date.issued | 2012 | en_US |
dc.identifier.issn | 0013-4651 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/15296 | - |
dc.identifier.uri | http://dx.doi.org/10.1149/2.074203jes | en_US |
dc.description.abstract | A methyltrimethoxysilane (MTMS) modified silica zeolite (MSZ) film has been prepared using a high ratio of MTMS/tetraethyl orthosilicate (TEOS). This study investigated the effect of MTMS addition on the low-k matrix structure, elastic modulus, and pore geometry. High MTMS loading reduced the k-value of MSZ film down to 2.0, but yielded a lower elastic modulus, 2.7 GPa. Based on grazing-incidence small-angle X-ray scattering (GISAXS) 2D pattern analysis, the pore geometry of the MSZ film was found to be small but elliptical (R(in-plane) similar to 3.75 nm; R(out-of-plane) similar to 3.04 nm). The elliptical pore shape was formed by a collapse of film structure at 150-160 degrees C as a result of similar to 32% thickness shrinkage due to the decomposition of tetra-n-propylammonium hydroxide (TPAOH), a structure directing catalyst, and due to a large degree of crosslinking reaction in the silica matrix. Combining GISAXS, (29)Si-NMR, and FT-IR results, we propose that the lower elastic modulus was caused by the incorporation of a large amount of methyl groups from the MTMS precursor and the elliptic pores. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.074203jes] All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | The Mechanical Property, Microstructure, and Pore Geometry of a Methyltrimethoxysilane Modified Silica Zeolite (MSZ) Film | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1149/2.074203jes | en_US |
dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
dc.citation.volume | 159 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.spage | G23 | en_US |
dc.citation.epage | G28 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000299292100058 | - |
dc.citation.woscount | 0 | - |
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