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dc.contributor.authorYang, Jianchengen_US
dc.contributor.authorCarey, Patricken_US
dc.contributor.authorRen, Fanen_US
dc.contributor.authorChen, Yen-Tingen_US
dc.contributor.authorLiao, Y.en_US
dc.contributor.authorChang, Chin-Weien_US
dc.contributor.authorLin, Jenshanen_US
dc.contributor.authorTadjer, Markoen_US
dc.contributor.authorPearton, S. J.en_US
dc.contributor.authorSmith, David J.en_US
dc.contributor.authorKuramata, Akitoen_US
dc.date.accessioned2019-10-05T00:09:47Z-
dc.date.available2019-10-05T00:09:47Z-
dc.date.issued2019-01-01en_US
dc.identifier.isbn978-1-5106-2481-8en_US
dc.identifier.issn0277-786Xen_US
dc.identifier.urihttp://dx.doi.org/10.1117/12.2515006en_US
dc.identifier.urihttp://hdl.handle.net/11536/152972-
dc.description.abstractReverse breakdown voltages larger than 1 kV have been reported for both unterminated Ga2O3 vertical rectifiers (1000-1600 V) and field-plated Schottky diodes (1076-2300 V) with an epi thickness of 8-20 mu m. If the doping is in the 10(16) cm range, the breakdown is usually in the 500-800V regime. Furthermore, the switching characteristics of discrete Ga2O3 vertical Schottky rectifiers exhibited reverse recovery times in the range of 20 to 30 ns. Large area (up to 0.2 cm(2)) Ga2O3 rectifiers were fabricated on a Si-doped n-Ga2O3 drift layer grown by halide vapor phase epitaxy on a Sn-doped n(+) Ga2O3 (001) substrate. A forward current of 2.2 A was achieved in single-sweep voltage mode, a record for Ga2O3 rectifiers. The on-state resistance was 0.26 Omega.cm(2) for these largest diodes, decreasing to 5.9 x 10 Omega.cm(2) for 40x40 mu m devices. We detail the design and fabrication of these devices. In addition, an inductive load test circuit was used to measure the switching performance of field-plated, edge-terminated Schottky rectifiers with a reverse breakdown voltage of 760 V (0.1 cm diameter, 7.85 x10(-3) cm(2) area) and an absolute forward current of 1 A on 8 mu m thick epitaxial beta-Ga2O3 drift layers. These devices were switched from 0.225 A to -700 V with t of 82 ns, and from 1 A to -300 V with t of 64 ns and no significant temperature dependence up to 125 degrees C. There was no significant temperature dependence of t(rr)up to 150 degrees C.en_US
dc.language.isoen_USen_US
dc.subjectGallium Oxideen_US
dc.subjectrectifiersen_US
dc.subjectswitchingen_US
dc.subjecton-state resistanceen_US
dc.subjectwide bandgap semiconductoren_US
dc.subjectedge terminationen_US
dc.subjectfield plateen_US
dc.subjectpower convertersen_US
dc.titleDC and dynamic switching characteristics of field-plated vertical geometry beta-Ga2O3 rectifiersen_US
dc.typeProceedings Paperen_US
dc.identifier.doi10.1117/12.2515006en_US
dc.identifier.journalOXIDE-BASED MATERIALS AND DEVICES Xen_US
dc.citation.volume10919en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電機工程學系zh_TW
dc.contributor.departmentDepartment of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000485095300006en_US
dc.citation.woscount0en_US
Appears in Collections:Conferences Paper