完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWang, Yudanen_US
dc.contributor.authorWu, Facaien_US
dc.contributor.authorLiu, Xingqiangen_US
dc.contributor.authorLin, Junen_US
dc.contributor.authorChen, Jui-Yuanen_US
dc.contributor.authorWu, Wen-Weien_US
dc.contributor.authorWei, Jingsongen_US
dc.contributor.authorLiu, Yuanen_US
dc.contributor.authorLiu, Qien_US
dc.contributor.authorLiao, Leien_US
dc.date.accessioned2019-12-13T01:12:16Z-
dc.date.available2019-12-13T01:12:16Z-
dc.date.issued2019-11-04en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5115531en_US
dc.identifier.urihttp://hdl.handle.net/11536/153145-
dc.description.abstractThe scaling down of switching media encounters high leakage current in the traditional oxide material based memristors, resulting in high power consumption of chips. Two-dimensional (2D) materials promise an ultimate device scaling down to atomic layer thickness. Herein, black phosphorus (BP) and its self-assembly phosphorous oxide (BP) memristors are constructed, which leverages the high on/off ratio operation of oxides and low leakage current of 2D materials with high performance. The memristors exhibit reproducible and reliable switching characteristics with the on/off ratio >10(7) and data retention >10(4) s. Depending on the high reproducibility, basic "AND" and "OR" gates have been constructed on flexible substrates. Moreover, on the basis of the symmetry and linearity of conductance in the devices, the neural network simulation for supervised learning presents an online learning accuracy of 91.4%. This work opens an avenue for future flexible electronics.en_US
dc.language.isoen_USen_US
dc.titleHigh on/off ratio black phosphorus based memristor with ultra-thin phosphorus oxide layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5115531en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume115en_US
dc.citation.issue19en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000496513200005en_US
dc.citation.woscount0en_US
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