Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Chen, Lih-Ren | en_US |
dc.contributor.author | Huang, Shen-Che | en_US |
dc.contributor.author | Chiu, Jo-Lun | en_US |
dc.contributor.author | Lu, Chien-Cheng | en_US |
dc.contributor.author | Su, Wei-Ming | en_US |
dc.contributor.author | Weng, Chen-Yuan | en_US |
dc.contributor.author | Shen, Huan-Yu | en_US |
dc.contributor.author | Lu, Tien-Chang | en_US |
dc.contributor.author | Chen, Hsiang | en_US |
dc.date.accessioned | 2020-01-02T00:04:23Z | - |
dc.date.available | 2020-01-02T00:04:23Z | - |
dc.date.issued | 2019-10-15 | en_US |
dc.identifier.issn | 0167-9317 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.mee.2019.111158 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/153417 | - |
dc.description.abstract | Degradation mechanisms of nitride-based near-ultraviolet (near-UV) light-emitting diodes (LEDs) were systematically analyzed by applying forward- and reverse-bias stresses to them in a salt water vapor ambient. The surface temperature of the forward-bias stress sample was higher than that of the reverse-bias stress sample. The high temperature of the forward-bias stress sample accelerated the chemical reaction of the device structure with salt water vapors and led to faster degradation. Composition analyses of the sample surface and cross-section were conducted to investigate the failure mechanism. The analyses results indicated that the erosion of the indium-tin-oxide layer enhanced the diffusion of the conducting metal into the LED crystal. The proposed method can effectively characterize the quality of near-UV LEDs in a short duration. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Failure mechanisms | en_US |
dc.subject | Reliability | en_US |
dc.subject | Near-UV LEDs | en_US |
dc.subject | Bias stress | en_US |
dc.title | Degradation mechanisms of bias stress on nitride-based near-ultraviolet light-emitting diodes in salt water vapor ambient | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.mee.2019.111158 | en_US |
dc.identifier.journal | MICROELECTRONIC ENGINEERING | en_US |
dc.citation.volume | 218 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000498756000004 | en_US |
dc.citation.woscount | 0 | en_US |
Appears in Collections: | Articles |