Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Li, Yang | en_US |
dc.contributor.author | Jin, Yaming | en_US |
dc.contributor.author | Lu, Xiaomei | en_US |
dc.contributor.author | Yang, Jan-Chi | en_US |
dc.contributor.author | Chu, Ying-Hao | en_US |
dc.contributor.author | Huang, Fengzhen | en_US |
dc.contributor.author | Zhu, Jinsong | en_US |
dc.contributor.author | Cheong, Sang-Wook | en_US |
dc.date.accessioned | 2020-02-02T23:54:38Z | - |
dc.date.available | 2020-02-02T23:54:38Z | - |
dc.date.issued | 2017-08-04 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1038/s41535-017-0047-2 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/153592 | - |
dc.description.abstract | Ferroelectric vortex in multiferroic materials has been considered as a promising alternative to current memory cells for the merit of high storage density. However, the formation of regular natural ferroelectric vortex is difficult, restricting the achievement of vortex memory device. Here, we demonstrated the creation of ferroelectric vortex-antivortex pairs in BiFeO3 thin films by using local electric field. The evolution of the polar vortex structure is studied by piezoresponse force microscopy at nanoscale. The results reveal that the patterns and stability of vortex structures are sensitive to the poling position. Consecutive writing and erasing processes cause no influence on the original domain configuration. The Z4 proper coloring vortex-antivortex network is then analyzed by graph theory, which verifies the rationality of artificial vortex-antivortex pairs. This study paves a foundation for artificial regulation of vortex, which provides a possible pathway for the design and realization of non-volatile vortex memory devices and logical devices. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Rewritable ferroelectric vortex pairs in BiFeO3 | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1038/s41535-017-0047-2 | en_US |
dc.identifier.journal | NPJ QUANTUM MATERIALS | en_US |
dc.citation.volume | 2 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000407437300001 | en_US |
dc.citation.woscount | 45 | en_US |
Appears in Collections: | Articles |