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dc.contributor.authorLin, Ho-Mayen_US
dc.contributor.authorWu, Shi-Yinen_US
dc.contributor.authorChang, Feng-Chihen_US
dc.contributor.authorYen, Ying-Chiehen_US
dc.date.accessioned2014-12-08T15:21:36Z-
dc.date.available2014-12-08T15:21:36Z-
dc.date.issued2011-12-15en_US
dc.identifier.issn0254-0584en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.matchemphys.2011.09.061en_US
dc.identifier.urihttp://hdl.handle.net/11536/15360-
dc.description.abstractPhotocurable resins, bisphenol A propoxylate glycerolate diacrylate (BPA-PGDA, containing two hydroxyl) and bisphenol A propoxylate diacrylate (BPA-PDA), with fixed photoinitiator (Irgacure 907) concentration and various contents of methacrylisobutyl polyhedral oligomeric silsesquioxane (MI-POSS) were prepared and characterized by FTIR spectroscopy, scanning electron microscope and differential photocalorimetry. The MI-POSS molecules form crystals or aggregated particles in the cured resin matrix. The BPA-PGDA series photocurable resins show higher viscosity and lower photo-polymerization reactivity than the BPA-PDA series resins. The photo-polymerization rate and conversion of BPA-PGDA series are improved with increasing MI-POSS content. On the contrary, the photo-polymerization behavior of BPA-PDA series photocurable resins remains nearly unchanged by the addition of MI-POSS. Hydrogen-bonding interaction between the hydroxyl of BPA-PGDA and the siloxane of MI-POSS tends to attract and concentrate these acrylate double bonds around MI-POSS particles and thus enhances the photo-polymerization rate and conversion. (C) 2011 Elsevier B.V. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectPolyhedral oligomeric silsesquioxanes (POSSs)en_US
dc.subjectPhotocurable resinsen_US
dc.subjectHydrogen bondingen_US
dc.subjectAcrylate monomeren_US
dc.titlePhoto-polymerization of photocurable resins containing polyhedral oligomeric silsesquioxane methacrylateen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.matchemphys.2011.09.061en_US
dc.identifier.journalMATERIALS CHEMISTRY AND PHYSICSen_US
dc.citation.volume131en_US
dc.citation.issue1-2en_US
dc.citation.spage393en_US
dc.citation.epage399en_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000298764800063-
dc.citation.woscount4-
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