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dc.contributor.authorLin, Bi-Hsuanen_US
dc.contributor.authorWu, Yu-Haoen_US
dc.contributor.authorWu, Tai-Singen_US
dc.contributor.authorWu, Yung-Chien_US
dc.contributor.authorLi, Xiao-Yunen_US
dc.contributor.authorLiu, Wei-Reinen_US
dc.contributor.authorTang, Mau-Tsuen_US
dc.contributor.authorHsieh, Wen-Fengen_US
dc.date.accessioned2020-02-02T23:54:40Z-
dc.date.available2020-02-02T23:54:40Z-
dc.date.issued2019-10-21en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.5123271en_US
dc.identifier.urihttp://hdl.handle.net/11536/153619-
dc.description.abstractHard X-ray excited optical luminescence (XEOL) with a nanofocused beam provides both excellent spatial resolution and high enough peak power density, which makes XEOL mapping and luminescence dynamics study achievable. We present here the time and X-ray intensity dependence of the near-band-edge (NBE) luminescence from the nonpolar a-plane MgZnO/ZnO multiple quantum wells (MQWs): the emission intensity increases more than 10 times after high X-ray irradiation. Different from the well-known NBE emission lifetime of ZnO (less than 1 ns), the long decay time gradually decreases from 130 ns to 35 ns with the increasing X-ray irradiation time. We attribute the observed changes in NBE luminescence to the excitation of the Mg-related energy state by the high energy X-ray nanobeam. This suggestion was further confirmed in the XEOL spectra of the Mg-doped and Si-doped c-plane GaN epi-films. Published under license by AIP Publishing.en_US
dc.language.isoen_USen_US
dc.titleHard X-ray nanoprobe and time-resolved XEOL to observe increasing luminescence of ZnO and GaN epitaxial structuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.5123271en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume115en_US
dc.citation.issue17en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department光電工程研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of EO Enginerringen_US
dc.identifier.wosnumberWOS:000503753600010en_US
dc.citation.woscount0en_US
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