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dc.contributor.authorLin, Meng-Yuen_US
dc.contributor.authorSheng, Yung-Shuanen_US
dc.contributor.authorChen, Shu-Hanen_US
dc.contributor.authorSu, Ching-Yuanen_US
dc.contributor.authorLi, Lain-Jongen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.date.accessioned2014-12-08T15:21:39Z-
dc.date.available2014-12-08T15:21:39Z-
dc.date.issued2011-11-01en_US
dc.identifier.issn1071-1023en_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.3646481en_US
dc.identifier.urihttp://hdl.handle.net/11536/15376-
dc.description.abstractAn alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 degrees C, a sheet resistance of 1.36 x 10(4) Omega/square can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3646481]en_US
dc.language.isoen_USen_US
dc.subjectannealingen_US
dc.subjectcarbonen_US
dc.subjectelectrical resistivityen_US
dc.subjectprecipitationen_US
dc.subjectsputter depositionen_US
dc.subjectthin filmsen_US
dc.titleGraphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1116/1.3646481en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.citation.volume29en_US
dc.citation.issue6en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000298538800106-
dc.citation.woscount1-
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