標題: | Narrow-Band Thermal Emitter with Titanium Nitride Thin Film Demonstrating High Temperature Stability |
作者: | Yang, Zih-Ying Ishii, Satoshi Doan, Anh Tung Shinde, Satish Laxman Dao, Thang Duy Lo, Yu-Ping Chen, Kuo-Ping Nagao, Tadaaki 照明與能源光電研究所 影像與生醫光電研究所 Institute of Lighting and Energy Photonics Institute of Imaging and Biomedical Photonics |
關鍵字: | narrow-band emission;refractory materials;Tamm plasmon polaritons;thermal emission;titanium nitrides |
公開日期: | 1-一月-1970 |
摘要: | A refractory wavelength selective thermal emitter is experimentally realized by the excitation of Tamm plasmon polaritons (TPPs) between a titanium nitride (TiN) thin film and a distributed Bragg reflector (DBR). The absorptance reaches nearly unity at approximate to 3.73 mu m with the bandwidth of 0.36 mu m in the experiment. High temperature stabilities are confirmed up to 500 and 1000 degrees C in ambient and in vacuum, respectively. When the TiN TPP structure is compared to the TiN-insulator-TiN (TiN-metal-insulator-metal (MIM)) structure, the former shows higher Q-factor, which indicates the advantage of choosing the TiN TTP structure against the MIM structure. The proposed refractory TiN TPP structure is lithography-free and scalable, which paves a way for large scale thermal emitters in practical usage. |
URI: | http://dx.doi.org/10.1002/adom.201900982 http://hdl.handle.net/11536/153894 |
ISSN: | 2195-1071 |
DOI: | 10.1002/adom.201900982 |
期刊: | ADVANCED OPTICAL MATERIALS |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |