標題: Narrow-Band Thermal Emitter with Titanium Nitride Thin Film Demonstrating High Temperature Stability
作者: Yang, Zih-Ying
Ishii, Satoshi
Doan, Anh Tung
Shinde, Satish Laxman
Dao, Thang Duy
Lo, Yu-Ping
Chen, Kuo-Ping
Nagao, Tadaaki
照明與能源光電研究所
影像與生醫光電研究所
Institute of Lighting and Energy Photonics
Institute of Imaging and Biomedical Photonics
關鍵字: narrow-band emission;refractory materials;Tamm plasmon polaritons;thermal emission;titanium nitrides
公開日期: 1-一月-1970
摘要: A refractory wavelength selective thermal emitter is experimentally realized by the excitation of Tamm plasmon polaritons (TPPs) between a titanium nitride (TiN) thin film and a distributed Bragg reflector (DBR). The absorptance reaches nearly unity at approximate to 3.73 mu m with the bandwidth of 0.36 mu m in the experiment. High temperature stabilities are confirmed up to 500 and 1000 degrees C in ambient and in vacuum, respectively. When the TiN TPP structure is compared to the TiN-insulator-TiN (TiN-metal-insulator-metal (MIM)) structure, the former shows higher Q-factor, which indicates the advantage of choosing the TiN TTP structure against the MIM structure. The proposed refractory TiN TPP structure is lithography-free and scalable, which paves a way for large scale thermal emitters in practical usage.
URI: http://dx.doi.org/10.1002/adom.201900982
http://hdl.handle.net/11536/153894
ISSN: 2195-1071
DOI: 10.1002/adom.201900982
期刊: ADVANCED OPTICAL MATERIALS
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