完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWang, Tsai-Teen_US
dc.contributor.authorChiang, Chao-Lungen_US
dc.contributor.authorLin, Yu-Changen_US
dc.contributor.authorSrinivasadesikan, Venkatesanen_US
dc.contributor.authorLin, Ming-Changen_US
dc.contributor.authorLin, Yan-Guen_US
dc.date.accessioned2020-05-05T00:01:32Z-
dc.date.available2020-05-05T00:01:32Z-
dc.date.issued2020-05-01en_US
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.apsusc.2020.145548en_US
dc.identifier.urihttp://hdl.handle.net/11536/153975-
dc.description.abstractIt was investigated the efficiency of hydrogen production from NiO-loaded TiO2 treated by methanol hydrogenation and functionalized by SCN ligand (SCN-M:(NiO/TiO2)). The effects of a p-n junction created between NiO and TiO2 were demonstrated to enhance significantly the overall photocatalytic performance. The optical and microstructural properties of SCN-M:(NiO/TiO2) were studied with ultraviolet-visible spectra (UV-Vis), photoluminescence (PL), Raman spectra, X-ray diffraction (XRD) and X-ray photoelectron spectra (XPS). The atomic and electronic configurations of SCN-M:(NiO/TiO2) were investigated with analysis of the X-ray absorption near-edge structure (XAS) in situ under irradiation with Xe lamp incorporating a filter (AM 1.5G). An effective quantum yield of 1.34% for hydrogen production was attained with SCN-M:(NiO/TiO2). Quantum-chemical calculations revealed a synergistic decrease of the band gap upon loading Ni, Ni-linked O-2 and anionic SCN-ligand binding. The optimal energy bandgap was decreased to 2.70 eV for (SCN/O-2)-3Ni@TiO2, which reasonably supported the enhancement of H-2 evolution.en_US
dc.language.isoen_USen_US
dc.subjectHydrogenationen_US
dc.subjectHydrogen evolutionen_US
dc.subjectQuantum-chemical calculationsen_US
dc.subjectXANES/EXAFS spectraen_US
dc.titleKSCN-activation of hydrogenated NiO/TiO2 for enhanced photocatalytic hydrogen evolutionen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.apsusc.2020.145548en_US
dc.identifier.journalAPPLIED SURFACE SCIENCEen_US
dc.citation.volume511en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000517883800067en_US
dc.citation.woscount0en_US
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