標題: Fabrication and Characterization of < 100 >-Oriented Quasi-single Crystalline Cu Lines
作者: Lu, Tien-Lin
Wu, John A.
Chen, Chih
材料科學與工程學系
Department of Materials Science and Engineering
公開日期: 1-三月-2020
摘要: Nanotwinned copper (nt-Cu) films with < 111 > crystal orientation were electroplated on Si wafers by pulse plating, with original grain size of similar to 1.4 mu m. By patterning and annealing the nt-Cu film at 450-500 degrees C for 1 h, we can grow a large number of < 100 >-oriented quasi-single crystal Cu lines that are 200 and 500 pm in length and 60 pm in width. We perform anisotropic grain growth on a Si substrate to fabricate quasi-single crystal Cu lines array of < 100 > crystal orientation. These large < 100 > Cu single crystals may have potential applications as interconnects in three-dimensional integrated circuit technology.
URI: http://dx.doi.org/10.1021/acs.cgd.9b01137
http://hdl.handle.net/11536/154084
ISSN: 1528-7483
DOI: 10.1021/acs.cgd.9b01137
期刊: CRYSTAL GROWTH & DESIGN
Volume: 20
Issue: 3
起始頁: 1485
結束頁: 1490
顯示於類別:期刊論文