完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Hwang, Yeong-Maw | en_US |
dc.contributor.author | Pan, Cheng-Tang | en_US |
dc.contributor.author | Lu, Ying-Xu | en_US |
dc.contributor.author | Jian, Sheng-Rui | en_US |
dc.contributor.author | Chang, Huang-Wei | en_US |
dc.contributor.author | Juang, Jenh-Yih | en_US |
dc.date.accessioned | 2020-05-05T00:02:24Z | - |
dc.date.available | 2020-05-05T00:02:24Z | - |
dc.date.issued | 2020-02-01 | en_US |
dc.identifier.uri | http://dx.doi.org/10.3390/mi11020180 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/154202 | - |
dc.description.abstract | The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 degrees C to 800 degrees C. The XRD results indicated that for annealing temperature in the ranged from 300 degrees C to 500 degrees C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 degrees C. Further increasing the annealing temperature to 700 degrees C and 800 degrees C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed. | en_US |
dc.language.iso | en_US | en_US |
dc.subject | Co thin films | en_US |
dc.subject | XRD | en_US |
dc.subject | pop-in | en_US |
dc.subject | nanoindentation | en_US |
dc.title | Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.3390/mi11020180 | en_US |
dc.identifier.journal | MICROMACHINES | en_US |
dc.citation.volume | 11 | en_US |
dc.citation.issue | 2 | en_US |
dc.citation.spage | 0 | en_US |
dc.citation.epage | 0 | en_US |
dc.contributor.department | 電子物理學系 | zh_TW |
dc.contributor.department | Department of Electrophysics | en_US |
dc.identifier.wosnumber | WOS:000520181500069 | en_US |
dc.citation.woscount | 0 | en_US |
顯示於類別: | 期刊論文 |