完整後設資料紀錄
DC 欄位語言
dc.contributor.authorHwang, Yeong-Mawen_US
dc.contributor.authorPan, Cheng-Tangen_US
dc.contributor.authorLu, Ying-Xuen_US
dc.contributor.authorJian, Sheng-Ruien_US
dc.contributor.authorChang, Huang-Weien_US
dc.contributor.authorJuang, Jenh-Yihen_US
dc.date.accessioned2020-05-05T00:02:24Z-
dc.date.available2020-05-05T00:02:24Z-
dc.date.issued2020-02-01en_US
dc.identifier.urihttp://dx.doi.org/10.3390/mi11020180en_US
dc.identifier.urihttp://hdl.handle.net/11536/154202-
dc.description.abstractThe correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 degrees C to 800 degrees C. The XRD results indicated that for annealing temperature in the ranged from 300 degrees C to 500 degrees C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 degrees C. Further increasing the annealing temperature to 700 degrees C and 800 degrees C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.en_US
dc.language.isoen_USen_US
dc.subjectCo thin filmsen_US
dc.subjectXRDen_US
dc.subjectpop-inen_US
dc.subjectnanoindentationen_US
dc.titleInfluence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.3390/mi11020180en_US
dc.identifier.journalMICROMACHINESen_US
dc.citation.volume11en_US
dc.citation.issue2en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000520181500069en_US
dc.citation.woscount0en_US
顯示於類別:期刊論文