Title: | Radial Linear Polymer Patterns Driven by the Marangoni Instability and Lateral Phase Separation for the Formation of Nanoscale Perforation Lines |
Authors: | Wu, Bo-Hao Chang, Kai-Chieh Hsu, Hsun-Hao Chiu, Yu-Jing Chiu, Tang-Yao Tseng, Hsiao-Fan Li, Jia-Wei Chen, Jiun-Tai 交大名義發表 應用化學系 National Chiao Tung University Department of Applied Chemistry |
Keywords: | Marangoni instability;perforation lines;phase separation under convection;radial linear patterns;spin-coating |
Issue Date: | 1-May-2019 |
Abstract: | Phase separation under convection, related to the Marangoni instability, is critical in the development of advanced polymer processing technologies. The formation mechanisms of polymer patterns driven by the phase separation under convection, however, still require further investigations. In this work, we study the phase separation of polystyrene (PS)/poly(methyl methacrylate) (PMMA) bilayer films during the spin-coating processes. PMMA film-coated glass substrates are dripped by PS solutions in toluene before spinning. The concentration gradients of the PS solutions and the swollen PMMA films cause the surface tension-driven Marangoni instability; lateral phase separations also occur during the spin-coating processes, forming the interesting and uncommon radial linear patterns with nanoscale heights on the PS/PMMA bilayer films. By changing the solution waiting time and spin rates, the surface morphologies of the PS/PMMA bilayer films can be controlled. At longer waiting times, the higher degrees of swelling of the PMMA films by the solvents allow the formation of the polymer patterns; at higher spin-coating rates, the faster solvent evaporation improves the ordering of the polymer patterns. Furthermore, the morphologies of the PS/PMMA bilayer films can be confirmed using the selective removal technique; the PS films with linear-arranged cavities and the PMMA films with bumps can be obtained using acetic acid and cyclohexane, respectively. Finally, a proof of concept on the potentials in applying the cavities-containing PS films for nanoscale perforation lines is also demonstrated. |
URI: | http://dx.doi.org/10.1021/acsanm.9b00615 http://hdl.handle.net/11536/154363 |
ISSN: | 2574-0970 |
DOI: | 10.1021/acsanm.9b00615 |
Journal: | ACS APPLIED NANO MATERIALS |
Volume: | 2 |
Issue: | 5 |
Begin Page: | 3253 |
End Page: | 3261 |
Appears in Collections: | Articles |