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dc.contributor.authorChung, Pei-Yunen_US
dc.contributor.authorCheng, Ming-Hsiangen_US
dc.contributor.authorTseng, Hsiao-Fanen_US
dc.contributor.authorLiu, Chih-Tingen_US
dc.contributor.authorChiu, Tang-Yaoen_US
dc.contributor.authorJeng, Kai-Shengen_US
dc.contributor.authorChi, Mu-Huanen_US
dc.contributor.authorChen, Jiun-Taien_US
dc.date.accessioned2020-07-01T05:21:20Z-
dc.date.available2020-07-01T05:21:20Z-
dc.date.issued2018-05-01en_US
dc.identifier.issn2574-0970en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acsanm.8b00201en_US
dc.identifier.urihttp://hdl.handle.net/11536/154410-
dc.description.abstractPoly(3-hexylthiophene) (P3HT) films have been usually prepared by spin-coating for the applications of electronic devices such as organic photovoltaic devices (OPV) and organic field-effect transistors (OFETs). The wetting and dewetting behaviors of the swollen P3HT films during the spin-coating processes, however, are still poorly understood. In this work, we investigate the dewetting behaviors of P3HT thin films and the formation of ring structures during the spin-coating process by controlling the spin rates and the solution temperatures. Quantitative studies of the dewetting phenomena are conducted by measuring the sizes of the ring structures of the dewetting patterns. It is observed that the sizes of the ring structures are larger at lower spin rates because of the longer dewetting times allowed during the spin-coating processes. More importantly, the dewetting behaviors of the P3HT films are discovered to be affected by the formation of the P3HT nanowhiskers (nanowires). This work offers a deeper understanding of the dewetting behaviors of swollen P3HT films during the spin-coating processes, which is crucial for the development of P3HT-based optoelectronic devices.en_US
dc.language.isoen_USen_US
dc.subjectdewettingen_US
dc.subjectnanowireen_US
dc.subjectpoly(3-hexylthiophene)en_US
dc.subjectsolvent annealingen_US
dc.subjectspin-coatingen_US
dc.titleDewetting of Swollen Poly(3-hexylthiophene) Films during Spin-Coating Processes: Implications for Device Fabricationen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/acsanm.8b00201en_US
dc.identifier.journalACS APPLIED NANO MATERIALSen_US
dc.citation.volume1en_US
dc.citation.issue5en_US
dc.citation.spage2021en_US
dc.citation.epage2028en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:000461400600002en_US
dc.citation.woscount2en_US
Appears in Collections:Articles