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dc.contributor.authorLiu, Chunhuien_US
dc.contributor.authorLv, Chunguangen_US
dc.contributor.authorKohler, Nicoleen_US
dc.contributor.authorWang, Xuesongen_US
dc.contributor.authorLin, Hongxiaoen_US
dc.contributor.authorHe, Zhiweien_US
dc.contributor.authorWu, Yu-Hsuanen_US
dc.contributor.authorLeu, Jihperngen_US
dc.contributor.authorWei, Shuhuaen_US
dc.contributor.authorZhang, Jingen_US
dc.contributor.authorYan, Jiangen_US
dc.contributor.authorPalov, Alexander P.en_US
dc.contributor.authorBaklanov, Mikhail R.en_US
dc.date.accessioned2020-10-05T01:59:43Z-
dc.date.available2020-10-05T01:59:43Z-
dc.date.issued2020-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.35848/1347-4065/ab86dcen_US
dc.identifier.urihttp://hdl.handle.net/11536/154853-
dc.description.abstractOrganosilicate (OSG) low dielectric constant films containing different concentrations of 1,3- and 1,3,5-benzene bridges between Si atoms are fabricated using 1,3,5-tribromobenzene via spin-on deposition and evaporation induced self-assembling. Chemical composition, pore structure, mechanical, dielectric and hydrophobic properties of as-prepared benzene bridged OSG thin films are studied using nuclear magnetic resonance, Fourier-transform infrared spectroscopy, ellipsometric porosimetry, nanoindentation, CV measurements and water contact angle. The precursors were synthesized by using two methods with the goal of understanding the effect of 1,3,5-benzene concentration on the films properties. It is shown that the films have very small pore size that does not change with porosity. No significant change in mechanical properties was observed at two different ratios of 1,3- and 1,3,5-benzene bridged films. (C) 2020 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleProperties of organosilicate low-k films with 1,3-and 1,3,5-benzene bridges between Si atomsen_US
dc.typeArticleen_US
dc.identifier.doi10.35848/1347-4065/ab86dcen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume59en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:000546609800018en_US
dc.citation.woscount0en_US
Appears in Collections:Articles