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dc.contributor.authorSharma, Chandanen_US
dc.contributor.authorSingh, Rajendraen_US
dc.contributor.authorChao, Der-Shengen_US
dc.contributor.authorWu, Tian-Lien_US
dc.date.accessioned2020-10-05T01:59:47Z-
dc.date.available2020-10-05T01:59:47Z-
dc.date.issued1970-01-01en_US
dc.identifier.issn0361-5235en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s11664-020-08318-0en_US
dc.identifier.urihttp://hdl.handle.net/11536/154906-
dc.description.abstractThis study examined the effects of three cumulative c-ray irradiation doses on AlGaN/GaN epilayer material and on high electron mobility transistor (HEMT) devices. After a cumulative gamma-ray dose of 16 kGy, the Hall mobility increased from 1800 cm(2)/V s to 2100 cm(2)/V s, as determined through Hall measurement. Atomic force microscopy indicated an improvement in surface roughness but no change in the surface potential (theta(s)). The HEMT device exhibited improvement in the drain current, with a subtle decreasing tendency in the leakage current. At high doses of gamma-ray irradiation, the trends in the material and device parameters saturated. Moreover, the metal-semiconductor interface degraded, as confirmed through scanning electron microscopy image analysis.en_US
dc.language.isoen_USen_US
dc.subjectAlGaNen_US
dc.subjectGaN epilayeren_US
dc.subjectHEMT deviceen_US
dc.subjectAFMen_US
dc.subjectsurface potentialen_US
dc.titleEffects of gamma-Ray Irradiation on AlGaN/GaN Heterostructures and High Electron Mobility Transistor Devicesen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s11664-020-08318-0en_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department國際半導體學院zh_TW
dc.contributor.departmentInternational College of Semiconductor Technologyen_US
dc.identifier.wosnumberWOS:000549796000001en_US
dc.citation.woscount0en_US
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