標題: | Effects of gamma-Ray Irradiation on AlGaN/GaN Heterostructures and High Electron Mobility Transistor Devices |
作者: | Sharma, Chandan Singh, Rajendra Chao, Der-Sheng Wu, Tian-Li 國際半導體學院 International College of Semiconductor Technology |
關鍵字: | AlGaN;GaN epilayer;HEMT device;AFM;surface potential |
公開日期: | 1-一月-1970 |
摘要: | This study examined the effects of three cumulative c-ray irradiation doses on AlGaN/GaN epilayer material and on high electron mobility transistor (HEMT) devices. After a cumulative gamma-ray dose of 16 kGy, the Hall mobility increased from 1800 cm(2)/V s to 2100 cm(2)/V s, as determined through Hall measurement. Atomic force microscopy indicated an improvement in surface roughness but no change in the surface potential (theta(s)). The HEMT device exhibited improvement in the drain current, with a subtle decreasing tendency in the leakage current. At high doses of gamma-ray irradiation, the trends in the material and device parameters saturated. Moreover, the metal-semiconductor interface degraded, as confirmed through scanning electron microscopy image analysis. |
URI: | http://dx.doi.org/10.1007/s11664-020-08318-0 http://hdl.handle.net/11536/154906 |
ISSN: | 0361-5235 |
DOI: | 10.1007/s11664-020-08318-0 |
期刊: | JOURNAL OF ELECTRONIC MATERIALS |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 期刊論文 |