Low temperature deposition of high quality single crystalline AlN thin films on sapphire using highly oriented monolayer MoS 2 as a buffer layer

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DC 欄位	值	語言
dc.contributor.author	Chien, Hung-Yi	en_US
dc.contributor.author	Kuo, Po-Chun	en_US
dc.contributor.author	Kao, Hui-Ling	en_US
dc.contributor.author	Chen, Jyh-Shin	en_US
dc.contributor.author	Chen, Meei-Ru	en_US
dc.contributor.author	Lu, Li-Syuan	en_US
dc.contributor.author	Chueh, Wei-Chen	en_US
dc.contributor.author	Chang, Wen-Hao	en_US
dc.date.accessioned	2020-10-05T01:59:48Z	-
dc.date.available	2020-10-05T01:59:48Z	-
dc.date.issued	2020-08-15	en_US
dc.identifier.issn	0022-0248	en_US
dc.identifier.uri	http://dx.doi.org/10.1016/j.jcrysgro.2020.125726	en_US
dc.identifier.uri	http://hdl.handle.net/11536/154931	-
dc.language.iso	en_US	en_US
dc.title	Low temperature deposition of high quality single crystalline AlN thin films on sapphire using highly oriented monolayer MoS 2 as a buffer layer	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1016/j.jcrysgro.2020.125726	en_US
dc.identifier.journal	JOURNAL OF CRYSTAL GROWTH	en_US
dc.citation.volume	544	en_US
dc.citation.spage	0	en_US
dc.citation.epage	0	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:000541156700005	en_US
dc.citation.woscount	0	en_US
顯示於類別：	期刊論文