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dc.contributor.authorNarra, Sudhakaren_US
dc.contributor.authorJokar, Efaten_US
dc.contributor.authorPearce, Orionen_US
dc.contributor.authorLin, Chia-Yien_US
dc.contributor.authorFathi, Amiren_US
dc.contributor.authorDiau, Eric Wei-Guangen_US
dc.date.accessioned2020-10-05T02:01:07Z-
dc.date.available2020-10-05T02:01:07Z-
dc.date.issued2020-07-16en_US
dc.identifier.issn1948-7185en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acs.jpclett.0c01589en_US
dc.identifier.urihttp://hdl.handle.net/11536/155159-
dc.description.abstractThe effects of additives SnF2 (10%) and EDAI(2) (1%) on the dynamics of carrier relaxation of formamidinium tin triiodide (FASnI(3)) perovskite were studied using femtosecond transient absorption spectra (TAS) with excitation at 600 and 870 nm. The TAS were analyzed according to a parallel sequential kinetic model with a global fit through singular-value decomposition. For excitation at 600 nm, two relaxation paths were found: one involved hot and cold carriers in the bulk state undergoing shallow bulk-defect-mediated charge recombination; the other involved trap carriers in the surface state undergoing deep surface-defect-mediated charge recombination. For excitation at 870 nm, only cold carriers were subjected to the bulk-state relaxation channel. Our spectral results indicate significant effects of the additives on retarding charge recombination in both bulk and surface states as well as decreasing the bandgap renormalization energy, the bandwidth of the photobleaching (PB) band, and the Stokes shift between the PB and photoluminescence bands, explaining how the device performance of FASnI(3) solar cells became enhanced in the presence of SnF2 and EDAI(2).en_US
dc.language.isoen_USen_US
dc.titleFemtosecond Transient Absorption Spectra and Dynamics of Carrier Relaxation of Tin Perovskites in the Absence and Presence of Additivesen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/acs.jpclett.0c01589en_US
dc.identifier.journalJOURNAL OF PHYSICAL CHEMISTRY LETTERSen_US
dc.citation.volume11en_US
dc.citation.issue14en_US
dc.citation.spage5699en_US
dc.citation.epage5704en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000551546100046en_US
dc.citation.woscount0en_US
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