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dc.contributor.authorWang, Weien_US
dc.contributor.authorCovi, Erikaen_US
dc.contributor.authorLin, Yu-Hsuanen_US
dc.contributor.authorAmbrosi, Eliaen_US
dc.contributor.authorIelmini, Danieleen_US
dc.date.accessioned2020-10-05T02:01:28Z-
dc.date.available2020-10-05T02:01:28Z-
dc.date.issued2019-01-01en_US
dc.identifier.isbn978-1-7281-4031-5en_US
dc.identifier.issn2380-9248en_US
dc.identifier.urihttp://hdl.handle.net/11536/155256-
dc.description.abstractThe understanding of the dynamic mechanism of volatile resistive switching memory devices is of paramount importance to further increase the switching speed. It is also of great value for future neuromorphic applications which use such devices in temporal domain In this work, we investigate the switching speed and retention time of metallic filamentary volatile resistive switching devices. We find that the switching speed can be quantitatively described by the ionic mobility, while the retention time can be quantitatively described by the surface ionic diffusion following the gradient descent of surface atomic concentration. Further analysis reveals that the ionic mobility and surface diffusivity can be connected with Einstein relation. Finally, evidences supporting this relation and experimental data showing the competition of the ionic drift and diffusion are collected and shown.en_US
dc.language.isoen_USen_US
dc.titleModeling of switching speed and retention time in volatile resistive switching memory by ionic drift and diffusionen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2019 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM)en_US
dc.citation.spage0en_US
dc.citation.epage0en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000553550000191en_US
dc.citation.woscount0en_US
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