Full metadata record
DC FieldValueLanguage
dc.contributor.authorShahbazi, Saeeden_US
dc.contributor.authorLi, Meng-Yuen_US
dc.contributor.authorFathi, Amiren_US
dc.contributor.authorDiau, Eric Wei-Guangen_US
dc.date.accessioned2020-10-05T02:02:02Z-
dc.date.available2020-10-05T02:02:02Z-
dc.date.issued2020-08-14en_US
dc.identifier.issn2380-8195en_US
dc.identifier.urihttp://dx.doi.org/10.1021/acsenergylett.0c01190en_US
dc.identifier.urihttp://hdl.handle.net/11536/155461-
dc.description.abstractApplying a two-step procedure and solvent engineering, we fabricated a stable tin-based perovskite, formamidinium tin triiodide (FASnI(3)), solar cell for lead-free photovoltaic applications. The first step was deposition of a SnI2 layer with the solvent dimethyl sulfoxide; the second step was application of a cosolvent system containing hexafluoro-2-propanol (HFP), isopropyl alcohol (IPA), and chlorobenzene (CB) in a 5:5:2 ratio to deposit the FAI layer on the SnI2 layer. The traditional IPA solvent prevented the formation of a stable FASnI(3) layer such that a stable device could not be fabricated. HFP was hence used to form hydrogen bonds with IPA and FM to retard the crystal growth of FASnI(3); CB served as the antisolvent. Ethylenediammonium dihypophosphite in the first step was an effective reducing agent to increase the efficiency of power conversion from similar to 5% to similar to 7% with great reproducibility and stability over 4000 h.en_US
dc.language.isoen_USen_US
dc.titleRealizing a Cosolvent System for Stable Tin-Based Perovskite Solar Cells Using a Two-Step Deposition Approachen_US
dc.typeArticleen_US
dc.identifier.doi10.1021/acsenergylett.0c01190en_US
dc.identifier.journalACS ENERGY LETTERSen_US
dc.citation.volume5en_US
dc.citation.issue8en_US
dc.citation.spage2508en_US
dc.citation.epage2511en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.department應用化學系分子科學碩博班zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.contributor.departmentInstitute of Molecular scienceen_US
dc.identifier.wosnumberWOS:000562954100008en_US
dc.citation.woscount0en_US
Appears in Collections:Articles