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dc.contributor.authorChen, Liang-Hsiangen_US
dc.contributor.authorLin, Pangen_US
dc.contributor.authorKim, Choongiken_US
dc.contributor.authorChen, Ming-Chouen_US
dc.contributor.authorHuang, Peng-Yien_US
dc.contributor.authorHo, Jia-Chongen_US
dc.contributor.authorLee, Cheng-Chungen_US
dc.date.accessioned2014-12-08T15:22:03Z-
dc.date.available2014-12-08T15:22:03Z-
dc.date.issued2012-02-01en_US
dc.identifier.issn1862-6254en_US
dc.identifier.urihttp://dx.doi.org/10.1002/pssr.201105534en_US
dc.identifier.urihttp://hdl.handle.net/11536/15651-
dc.description.abstractThis study investigates the correlation between surface energy of polymer dielectrics and the film morphology, microstructure, and thin-film transistor performance of solution-processed 5,11-bis(triethylsilylethynyl) anthradithiophene (TES-ADT) films. The low surface energy polyimide (PI) dielectric induced large grains with strong X-ray reflections for spin-cast TES-ADT films in comparison to high surface energy poly(4-vinyl phenol) (PVP) dielectric. Furthermore, thin-film transistors based on spin-cast TES-ADT films on PI dielectric exhibited enhanced electrical performance, small hysteresis, and high stability under bias stress with carrier mobility as high as 0.43 cm(2)/Vs and a current on/off ratio of 10(7). (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheimen_US
dc.language.isoen_USen_US
dc.subjectorganic thin-film transistorsen_US
dc.subjecttriethylsilylethynyl anthradithiopheneen_US
dc.subjectpolymersen_US
dc.subjectdielectric materialsen_US
dc.subjectsurface energyen_US
dc.titleInfluence of polymer dielectric surface energy on thin-film transistor performance of solution-processed triethylsilylethynyl anthradithiophene (TES-ADT)en_US
dc.typeArticleen_US
dc.identifier.doi10.1002/pssr.201105534en_US
dc.identifier.journalPHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERSen_US
dc.citation.volume6en_US
dc.citation.issue2en_US
dc.citation.spage71en_US
dc.citation.epage73en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000300768400008-
dc.citation.woscount3-
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