標題: | Investigation of the Galvanic Effect between RuN Barriers and Cu Seed Layers |
作者: | Wu, Chia-Yang Lee, Wen-Hsi Chang, Shih-Chieh Wang, Ying-Lang 照明與能源光電研究所 Institute of Lighting and Energy Photonics |
公開日期: | 1-十二月-2011 |
摘要: | In this study, we investigated the galvanic effect between the Cu metals and ruthenium nitride (RuNx) films that were deposited at various nitrogen (N-2) gas flow rates in chemical mechanical polishing slurries. It was found that the galvanic corrosion of the RuNx films was inhibited with increasing N-2 gas flow ratio, whereas the galvanic corrosion of the Cu seed layers was enhanced. Electrochemical impedance spectroscopy showed that the galvanic corrosion resistance of RuNx increased and that of the ruthenium oxide layer decreased as N-2 flow ratio increased. This was because the increase in the N content in the RuNx films inhibited the corrosion and oxidation of the Ru metals. (C) 2011 The Japan Society of Applied Physics |
URI: | http://dx.doi.org/10.1143/JJAP.50.121803 http://hdl.handle.net/11536/15718 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.50.121803 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS |
Volume: | 50 |
Issue: | 12 |
結束頁: | |
顯示於類別: | 期刊論文 |