標題: Design and Fabrication of Sub-Wavelength Structure on Silicon Nitride for Solar Cells
作者: Sahoo, Kartika Chandra
Li, Yiming
Lin, Men-Ku
Chang, Edward Yi
Huang, Jin-Hua
材料科學與工程學系
Department of Materials Science and Engineering
關鍵字: Silicon Nitride;Sub-Wavelength Structure;Antireflection Coating;Reflectance;Efficiency;Maxwell Equations;Rigorous Coupled-Wave Approach;Modeling and Simulation;Fabrication and Characterization
公開日期: 2009
摘要: In this study, we explore the spectral reflectivity of pyramid-shaped silicon nitride (Si3N4) sub-wavelength structures (SWS). First, a multilayer rigorous coupled-wave approach is advanced to investigate the reflection properties of Si3N4 SWS. We first optimize Si3N4 SWS structure for the best effective reflectance properties. The results of our study show that a lowest effective reflectivity of 1.77% can be obtained for the examined Si3N4 SWS with the height of etched part of Si3N4 and the thickness of non-etched layer of 150 nm and 70 nm. Then, we develop a simple and scalable approach for fabricating SWS on silicon nitride by means of self-assembled nickel nano particle masks and inductively coupled plasma ion etching. Silicon nitride SWS surfaces with diameter of 120 nm - 180 nm and a height of 150 nm - 160 nm were obtained for lowest average reflectivity for wavelength range from 190 nm to 1000 nm. A low reflectivity below 1% was observed over wavelength from 600 to 800 nm. The measured reflectivity is closely matched with the simulated results. Using the measured reflectivity data, the solar cell characteristics has further been compared for single layer antireflection coatings and SWS structures and a 1.31% improvement in efficiency was observed.
URI: http://hdl.handle.net/11536/15922
ISBN: 978-981-08-3694-8
期刊: 2009 9TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)
結束頁: 109
Appears in Collections:Conferences Paper