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dc.contributor.authorLi, F. -L.en_US
dc.contributor.authorLin, K. -M.en_US
dc.contributor.authorYang, Y. -W.en_US
dc.contributor.authorHung, C. -T.en_US
dc.contributor.authorWu, J. -S.en_US
dc.contributor.authorYu, J. -P.en_US
dc.date.accessioned2014-12-08T15:23:04Z-
dc.date.available2014-12-08T15:23:04Z-
dc.date.issued2012-06-01en_US
dc.identifier.issn0272-4324en_US
dc.identifier.urihttp://hdl.handle.net/11536/16224-
dc.description.abstractIn this paper, a planar atmospheric-pressure dielectric barrier discharge (AP-DBD) of nitrogen mixed with ammonia (0-2 %) is simulated using one-dimensional self-consistent fluid modeling with cell-centered finite-volume method. This AP-DBD is driven by a 30 kHz power source with distorted sinusoidal voltages. The simulated discharge current densities are found to be in good agreement with the experiment data in both phase and magnitude. The simulated results show that the discharges of N-2 mixed with NH3 (0-2 %) are all typical Townsend-like discharges because the ions always outnumber the electrons very much which leads to no quasi-neutral region in the gap throughout the cycle. N-2 (+) and N-4 (+) are found to be the most abundant charged species during and after the breakdown process, respectively, like a pure nitrogen DBD. NH4 (+) increases rapidly initially with increasing addition of NH3 and levels off eventually. In addition, N is the most dominant neutral species, except the background species, N-2 and NH3, and NH2 and H are the second dominant species, which increase with increasing added NH3. The existence of abundant NH2 plays an important role in those applications which require functional group incorporation.en_US
dc.language.isoen_USen_US
dc.subjectFluid modelingen_US
dc.subjectFinite-volume methoden_US
dc.subjectAtmospheric-pressure dielectric barrier dischargeen_US
dc.subjectNitrogenen_US
dc.subjectAmmoniaen_US
dc.subjectTownsend-like dischargeen_US
dc.titleNumerical Investigation of a Parallel-Plate Atmospheric-Pressure Nitrogen/Ammonia Dielectric Barrier Dischargeen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.journalPLASMA CHEMISTRY AND PLASMA PROCESSINGen_US
dc.citation.volume32en_US
dc.citation.issue3en_US
dc.citation.epage547en_US
dc.contributor.department機械工程學系zh_TW
dc.contributor.departmentDepartment of Mechanical Engineeringen_US
dc.identifier.wosnumberWOS:000304173500009-
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