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dc.contributor.authorChen, Cheng-Changen_US
dc.contributor.authorChiu, Ching-Hsuehen_US
dc.contributor.authorTu, Po-Minen_US
dc.contributor.authorKuo, Ming-Yenen_US
dc.contributor.authorShih, M. H.en_US
dc.contributor.authorHuang, Ji-Kaien_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:23:18Z-
dc.date.available2014-12-08T15:23:18Z-
dc.date.issued2012-04-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/04DG02en_US
dc.identifier.urihttp://hdl.handle.net/11536/16352-
dc.description.abstractIn this study, large-area GaN-based photonic quasicrystal (PQC) nanopillars were fabricated on an n-GaN substrate using the nanoimprint lithography (NIL) technique. Under optical pumping condition, a high lasing action from the GaN photonic quasicrystals was observed. The lasing wavelength is at 366nm with a low threshold power density of 0.009 kW/cm(2). To confirm the band-edge lasing mode, the finite-element method (FEM) was used to perform the simulation for the 12-fold symmetry photonic quasicrystal lattices. (C) 2012 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleLarge Area of Ultraviolet GaN-Based Photonic Quasicrystal Laseren_US
dc.typeArticleen_US
dc.identifier.doi04DG02en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume51en_US
dc.citation.issue4en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000303928600057-
dc.citation.woscount3-
Appears in Collections:Articles


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